J 2016

Fluorescence (TALIF) measurement of atomic hydrogen concentration in a coplanar surface dielectric barrier discharge

MRKVIČKOVÁ, Martina, Jozef RÁHEĽ, Pavel DVOŘÁK, David TRUNEC, Tomáš MORÁVEK et. al.

Basic information

Original name

Fluorescence (TALIF) measurement of atomic hydrogen concentration in a coplanar surface dielectric barrier discharge

Name in Czech

Fluorescenční (TALIF) měření koncentrace atomárního vodíku v koplanárním povrchovém dielektrickém bariérovém výboji

Authors

MRKVIČKOVÁ, Martina (203 Czech Republic, guarantor, belonging to the institution), Jozef RÁHEĽ (703 Slovakia, belonging to the institution), Pavel DVOŘÁK (203 Czech Republic, belonging to the institution), David TRUNEC (203 Czech Republic, belonging to the institution) and Tomáš MORÁVEK (703 Slovakia, belonging to the institution)

Edition

Plasma Sources Science and Technology, Bristol, IOP Pub. 2016, 0963-0252

Other information

Language

English

Type of outcome

Article in a journal

Field of Study

Plasma physics and discharge through gases

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

is not subject to a state or trade secret

References:

RIV identification code

RIV/00216224:14310/16:00088105

Organization

Přírodovědecká fakulta – Repository – Repository

UT WoS

000384000400008

Keywords (in Czech)

laserem indukovaná fluorescence; TALIF; atomární vodík; dielektrický bariérový výboj; povrchový výboj

Keywords in English

laser-induced fluorescence; TALIF; atomic hydrogen; H; dielectric barrier discharge; surface discharge

Links

ED2.1.00/03.0086, research and development project. GA13-24635S, research and development project. LO1411, research and development project. 7AMB14SK204, research and development project.
Changed: 3/9/2020 04:05, RNDr. Daniel Jakubík

Abstract

V originále

Spatially and temporally resolved measurements of atomic hydrogen concentration above the dielectric of coplanar barrier discharge are presented for atmospheric pressure in 2.2% H2/Ar. The measurements were carried out in the afterglow phase by means of two-photon absorption laser-induced fluorescence (TALIF). The difficulties of employing the TALIF technique in close proximity to the dielectric surface wall were successfully addressed by taking measurements on a suitable convexly curved dielectric barrier, and by proper mathematical treatment of parasitic signals from laser–surface interactions. It was found that the maximum atomic hydrogen concentration is situated closest to the dielectric wall from which it gradually decays. The maximum absolute concentration was more than 10^22 m-3. In the afterglow phase, the concentration of atomic hydrogen above the dielectric surface stays constant for a considerable time (10 us - 1 ms), with longer times for areas situated farther from the dielectric surface. The existence of such a temporal plateau was explained by the presented 1D model: the recombination losses of atomic hydrogen farther from the dielectric surface are compensated by the diffusion of atomic hydrogen from regions close to the dielectric surface. The fact that a temporal plateau exists even closest to the dielectric surface suggests that the dielectric surface acts as a source of atomic hydrogen in the afterglow phase.

Files attached