| SCHÄFER, Jan, Jaroslav HNILICA, Jiří ŠPERKA, Antje QUADE, Vít KUDRLE, Rüdiger FOEST, Jiří VODÁK and Lenka ZAJÍČKOVÁ. Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure. Surface and Coatings Technology. Elsevier, 2016, vol. 295, 15 June 2016, p. 112-118. ISSN 0257-8972. |
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@article{21906,
author = {Schäfer, Jan and Hnilica, Jaroslav and Šperka, Jiří and Quade, Antje and Kudrle, Vít and Foest, Rüdiger and Vodák, Jiří and Zajíčková, Lenka},
article_number = {15 June 2016},
keywords = {Tetrakis(trimethylsilyloxy)silane; Tetrakis(trimethylsiloxy)silane; Plasma jet; Silicon dioxide},
language = {eng},
issn = {0257-8972},
journal = {Surface and Coatings Technology},
title = {Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure},
volume = {295},
year = {2016}
}
TY - JOUR
ID - 21906
AU - Schäfer, Jan - Hnilica, Jaroslav - Šperka, Jiří - Quade, Antje - Kudrle, Vít - Foest, Rüdiger - Vodák, Jiří - Zajíčková, Lenka
PY - 2016
TI - Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure
JF - Surface and Coatings Technology
VL - 295
IS - 15 June 2016
SP - 112-118
EP - 112-118
PB - Elsevier
SN - 0257-8972
KW - Tetrakis(trimethylsilyloxy)silane
KW - Tetrakis(trimethylsiloxy)silane
KW - Plasma jet
KW - Silicon dioxide
N2 - We performed the thin films deposition using atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) by means of a radiofrequency and a microwave plasma jets operating with mixtures of argon and tetrakis(trimethylsilyloxy)silane (TTMS).
ER -
SCHÄFER, Jan, Jaroslav HNILICA, Jiří ŠPERKA, Antje QUADE, Vít KUDRLE, Rüdiger FOEST, Jiří VODÁK and Lenka ZAJÍČKOVÁ. Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure. \textit{Surface and Coatings Technology}. Elsevier, 2016, vol.~295, 15 June 2016, p.~112-118. ISSN~0257-8972.
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